Polymer Scientist – Nano-Scale Lithography Startup (Stealth)
About Us
We are a well-funded, VC-backed Bay Area startup pioneering next-generation lithography tools. Our mission is to revolutionize semiconductor fabrication through a breakthrough nano-fabrication approach that combines a proprietary photomask architecture with visible light to achieve unprecedented feature sizes (1–4 nm) – beyond the most ambitious semiconductor roadmaps and at a fraction of the cost. Early applications include advanced logic, quantum devices, and specialty photonics. If the prospect of slashing EUV’s cost curve and leapfrogging its resolution limit excites you, this is the role to explore.
The Role
We’re looking for a hands-on Polymer Scientist to own and accelerate the polymer/resist side of our platform—and, more broadly, to lead the materials direction of our atomic-scale lithography technology, driving fast progress today while shaping the next wave of breakthroughs. This role is for someone who wants deep applied R&D with real-world impact. Near term: select, evaluate, and optimize commercially available polymer/resist systems to achieve repeatability, tunability, and process control. Longer term: pioneer new material paradigms beyond conventional resists-new regimes including novel resist concepts, resist-free pattern transfer, direct metal deposition, and other frontier approaches. You will work closely with our nanofab, mask, and optics teams to translate nanoscale exposure physics into robust, manufacturable outcomes.
What You’ll Do
• Develop and optimize polymer resist formulations and processing workflows (using commerialy avalible polymers).
• Build repeatable thin-film processes (spin coating, casting/immersion methods, bake/cure protocols, solvent development/rinse).
• Establish metrology and quality controls: FTIR/Raman/NMR (as relevant), DSC/TGA, GPC (as needed), rheology/viscosity, thickness & uniformity (ellipsometry/profilometry), adhesion, solvent resistance, shrinkage, and defect control.
• Run structured DOE experiments, document protocols, and drive reproducibility across users and sites.
• Collaborate daily with the lithography/nanofab team to translate mask + exposure conditions into polymer response (contrast, threshold, kinetics, line/feature fidelity).
• Maintain strong lab practices (EHS, chemical hygiene, clean documentation, labeling, traceability).
Required Experience & Expertise
• Strong hands-on background in polymer chemistry / materials chemistry (industry or academic).
• Demonstrated experience with polymerization/crosslinking systems (e.g., radical, thermal, photo-initiated – whatever you’ve mastered).
• Practical experience making and analyzing thin polymer films and troubleshooting real-world variability.
• Comfortable operating in a fast-paced, resource-lean startup environment (high ownership, quick iteration).
• MS/PhD in Chemistry, Materials Science, Chemical Engineering, or related field (or equivalent industry experience).
Preferred Experience
• Experience with lithography resists (nanoimprint materials, photoresists, chemically amplified resists, block copolymers, specialty coatings).
• Familiarity with surface chemistry/adhesion on Si, glass, oxides, and metals; primers/adhesion promoters.
• Experience working alongside cleanroom/nanofab workflows and SEM/AFM-based feedback loops.
• Prior startup experience or demonstrated “builder” mindset.
Location
Palo Alto. On-site lab work is a core part of this role.
Please contact Moe Reitman at moe@moereitman.com for more information about this role